Method and apparatus for real time monitoring of industrial...

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Involving measuring – analyzing – or testing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S775000, C205S787000, C205S789000, C205S793500, C705S014270

Reexamination Certificate

active

10621247

ABSTRACT:
The present invention relates generally to any electrolyte and methods for monitoring the constituents contained therein. More specifically, the present invention relates to plating baths and methods for monitoring the constituents contained therein based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques of modeling power, outlier detection, regression and calibration transfer for analysis of voltammetric data obtained for various plating baths.

REFERENCES:
patent: 4631116 (1986-12-01), Ludwig
patent: 4812210 (1989-03-01), Bonivert et al.
patent: 4917774 (1990-04-01), Fisher
patent: 5192403 (1993-03-01), Chang et al.
patent: 5196096 (1993-03-01), Chang et al.
patent: 5223118 (1993-06-01), Sonnenberg et al.
patent: 5298129 (1994-03-01), Eliash
patent: 5298131 (1994-03-01), Eliash et al.
patent: 5336380 (1994-08-01), Phan et al.
patent: 5755954 (1998-05-01), Ludwig et al.
patent: 6331244 (2001-12-01), Lewis et al.
patent: 6365033 (2002-04-01), Graham et al.
patent: 2005/0183958 (2005-08-01), Wikiel et al.
Schneider, J., “Cross Validation” Feb. 1997, http://www.cs.cmu.edu/˜schneide/tut5
ode42.html.
E. Richards et al, “Multivariate Data Analysis in Electroanalytical Chemistry”, Electroanalysis, vol. 14, Issue 22, Nov. 2002, pp. 1533-1542.
Haak, et al. “Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths, Part One Polyether-Sulfate-Based Additives”, Tench Plating and Surface Finishing, 68 (4) 1981, 52.
Haak, et al. “Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths, Part Two, Sulfoniumalkanesulfonate-Based Additives”, Tench Plating and Surface Finishing, 69 (3) 1982, 62.
Graham & Lindberg, “Steady-State Chemical Analysis of Organic Suppressor Additives used in Copper Plating Baths”, ECS Meeting Honolulu, 1999, Abstract # 729.
Freitag, et al. “Determination of the Individual Additive Components in Acid Copper Plating Baths”, Plating and Surace Finishing, 70, 10, 1983, 55.
Tench & White, “Cyclic Pulse Voltammetric Stripping Analysis Of Acid Copper Plating Baths”, J. Electrochem. Soc., 132, 4, 1985, 831.
Krafcik, et al. “An In-Situ Sensor for Monitoring Organic Additives in Copper Plating Solutions”, Proceedings of the World Congress on Metal Finishing, Interfinish 92, International Union of Surface Finishing, Brasil, Oct. 1992.
Newton & Kaiser, “Analysis of Copper Plating Baths—New Developments”, ECS Meeting Toronto, 1999, Abstract # 357.
Horkans & Dukovic, “Monitoring of SPS-Based Additives in Cu Plating”, ECS Meeting Toronto, 1999, Abstract # 360.
Brown & Bear, “Chemometric Techniques in Electrochemistry: A Critical Review”, Critical Reviews in Analytical Chemistry, 24(2):99-131, 1993.
Ni, et al. “Simultaneous Polarographic Analysis of Pyrazine and its Methyl Derivatives by Iterative Target Transformation Factor Analysis”, Analytica Chimica Acta 316 (1995) 233-238.
Ni, et al. “Simultaneous Adsorptive Voltammetric Analysis of Mixed Colorants by Multivariate Calibration Approach”, Analytica Chimica Acta 329, 1996, 65-72.
Ni, et al “Multicomponent Chemometric Determination of Colorant Mixtures by Voltammetry”, Analytical Letters, 30(9), 1761-1777, 1997.
Ni, et al. “Voltammetric Determination of Butylated Hydroxyanisole, Butylated Hydroxytoluene, Propyl Gallate and Tert-Butylhydroquinone by use of Chemometric Approaches”, Analytica Chimica Acta 412, 2000, 185-193.
Ni, et al. “Voltammetric Determination of Chlorpromazine Hydrochloride and Promethazine Hydrochloride with the Use of Multivariate Calibration”, Analytica Chimica Acta 439, 2001, 159-168.
Lomillo, et al. “Resolution of Ternary Mixtures of Rifampicin, Isoniazid and Pyrazinamide by Differential Pulse Polarography and Partial Least Squares Method”, Analytica Chimica Acta 449, 2001, 167-177.
Allus and Brereton, “Determination of Thallium in Cement Dust and Sediment Samples by Differential-Pulse Anodic Stripping Voltammetry: A Chemometric Approach to Linear Calibration”, Analyst, Jul. 1992, vol. 117.
Cabanillas, et al. “Resolution of Ternary Mixtures of Nitrofurantoin, Furzolidone and Furaltadone by Application of Partial Least Squares Analysis to the Differential Pulse Polarographic Signals”, Talanta, vol. 41, No. 11, pp. 1821-1832, 1994.
Cabanillas, et al. “Abilities of Differentiation and Partial Least Squares Methods in the Analysis by Differential Pulse Polarography Simultaneous Determination of Furazolidone and Furaltadone”, Analytica Chimica Acta 302, 1995, 9-19.
Diaz, et al. “Polarographic Behaviour of Sulfadiazine, Sulfamerazine, Sulfamethazine and Their Mixtures. Use of Partial Least Squares in the Resolution of the Non-additive Signals of These Compounds”, Analyst, Apr. 1996, vol. 121, 547-552.
Guiberteau, “Indirect Voltammetric Determination of Carbaryl and Carbofuran Using Partial Least Squares Calibration”, Analytica Chimica Acta, 305, 1995, 219-226.
Diaz, “Voltammetric Behavior and Simultaneous Determination of the Antioxidants Propyl Gallate, Butylated Hydroxyanisole, and Butylated Hydroxytoluene in Acidic Acetonitrile-Water Medium Using PLS Calibration”, Electroanalysis, 1998, 10, No. 7.
Cabanillas, et al. “Resolution by Polarographic Techniques of Atrazine-Simazine and Terbutryn-Prometryn Binary Mixtures by Using PLS Calibration and Artifical Neural Networks”, Analyst, 2000, 125, 909-914.
Lastres, et al. “Use of Neural Networks in Solving Interferences Caused by Formation of Intermetallic Compounds in Anodic Stripping Voltammetry”, Electroanalysis, 1997, 9, No. 3.
Chan, et al. “Artificial neural network Processing of Stripping Analysis Responses for Identifying and Quantifying Heavy Metals in the Presence of Intermetallic Compound Formation”, Anal. Chem, 1997, 69, 2373-2378.
Richards, et al. “Optimisation of a Neural network Model for Calibration of Voltammeric Data”, Chemometrics and Intelligent Laboratory Systems, 61, 2002, 35-49.
Wehrens, et al. “Calibration of an Array of Voltammetric Microelectrodes”, Analytica Chimica Acta 334, 1996, 93-101.
Matos, et al. “Modified Microelectrodes and Multivariate Calibration for Flow Injection Amperometric Simultaneous Determination of Ascorbic Acid, Dopamine, Epinephrine and Dipyrone”, Analyst, 125, 2011-2015, 2000.
Diaz-Cruz, et al. “Application of Multivariate Curve Resolution to Voltammetric Data. Part 1. Study of Zn(II) Complexation with Some Polyelectrolytes”, Journal of Electroanalytical Chemistry 393, 7-16, 1995.
Mendieta, et al. “Application of Multivariate Curve Resolution to Voltammetric Data”, Analytical Biochemistry, 240, 134-141, 1996.
Diaz-Cruz, et al. “Cadmium-Binding Properties of Glutathione: A Chemometrical Analysis of Voltammetric Data”, Electroanal. Chem., 393, 1995, 7.
Diaz-Cruz, et al. “Study of the Zinc-Binding Properties of Glutathione by Differential Pulse Polarography and Multivariate Curve Resolution”, Journal of Inorganic Biochemistry, 70, 1998, 91-98.
Diaz-Cruz, et al. “Zinc-binding properties of the C-Terminal Hexapeptide Lys-Cys-Thr-Cys-Cys-Ala from Mouse Metallothionein: Analysis by Differential Pulse Polargraphy and Multivariate Curve Resolution”, Analytica Chimica Acta 385, 1999, 353-363.
Diaz-Cruz, et al. “Complexation of Cadmium by the C-terminal hexapeptride Lys-Cys-Thr-Cys-Cys-Ala from Mouse Metallothionein: Study by differential pulse polarography and circular dichroism spectroscopy with multivariate curve resolution analysis”, Analytica Chimica Acta 390, 1999, 15-25.
Diaz-Cruz, et al. “Differential Pulse Polarographic Study o

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for real time monitoring of industrial... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for real time monitoring of industrial..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for real time monitoring of industrial... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3755167

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.