Method and apparatus for real time monitoring of...

Data processing: artificial intelligence – Plural processing systems

Reexamination Certificate

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C205S775000

Reexamination Certificate

active

07124120

ABSTRACT:
The present invention relates generally to any plating solution and methods for monitoring its performance. More specifically, the present invention relates to plating bath and methods for monitoring its plating functionality based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques to describe quantitatively plating bath functionality in order to maintain its proper performance.

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