Surgery – Instruments – Electrical application
Patent
1999-03-16
2000-10-24
Cohen, Lee
Surgery
Instruments
Electrical application
606 34, 606 45, A61B 1812
Patent
active
06135998&
ABSTRACT:
A method for performing electrosurgery using sub-microsecond, high-power electrical pulses applied to an electrosurgical probe endface. The probe endface has an area of about 200-1000 microns.sup.2. The pulses have a duration less than 300 nanoseconds, and preferably have very fast risetimes and very fast falltimes (e.g. less than 100 nanoseconds). The pulses also have power dissipation greater than 500 Watts (e.g. 800-2500 Watts), or voltage greater than 1.5 kV (e.g. 2-3 kV). These pulse characteristics provide for reduced collateral damage, and effective cutting of tissue. Cutting is mainly provided by plasma streamers which are formed on the probe tip endface. However, cutting is also provided by shock waves formed by the discharges. The method is applicable to microsurgical procedures such as retinal surgery and capsulotomy. Also disclosed are electrical circuits for performing the method.
REFERENCES:
patent: 3903891 (1975-09-01), Brayshaw
patent: 4429694 (1984-02-01), McGreevy
patent: 5300068 (1994-04-01), Rosar et al.
patent: 5509916 (1996-04-01), Taylor
patent: 5669907 (1997-09-01), Platt, Jr. et al.
patent: 5720745 (1998-02-01), Farin et al.
patent: 5871469 (1999-02-01), Eggers et al.
Palanker, D, Electrical alternative to pulsed fiber-delivered lasers in microsurgery, J. Appl. Phys. 81(11), pp. 7673-7680, 1997.
Board of Trustees of the Leland Stanford Junior University
Cohen Lee
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