Fluid handling – Processes – With control of flow by a condition or characteristic of a...
Reexamination Certificate
2002-05-23
2004-06-22
Krishnamurthy, Ramesh (Department: 3753)
Fluid handling
Processes
With control of flow by a condition or characteristic of a...
C137S597000, C137S002000, C137S487500, C137S883000, C118S715000
Reexamination Certificate
active
06752166
ABSTRACT:
The present invention is directed to fluid processing systems, and more particularly to a fluid processing system that is capable of providing a plurality of process fluid flows, each providing a predetermined amount of process fluid relative to a total flow of process fluid.
Fluid processing systems are used in the semiconductor and pharmaceutical industries (as well as in other industries) to provide a precise quantity of fluid or fluids to a processing chamber. For example, in the semiconductor industry, fluid processing systems may be used to provide precisely metered quantities of fluid or fluids to a semiconductor wafer processing chamber. In a typical fluid processing system, each of a plurality of fluid supplies are respectively coupled to a mass flow controller that is capable of providing a precisely metered amount of fluid to a common manifold. The common manifold is fluidly coupled to an inlet of the process chamber. Conventionally, the process chamber has only a single inlet to receive the flow of process fluids from the common manifold.
SUMMARY OF THE INVENTION
According to an aspect of the present invention, a fluid processing system is provided that can receive a first amount of fluid and provide a plurality of second amounts of the fluid to a plurality of fluid outlets, with each of the plurality of second amounts of the fluid having a predetermined ratio relative to the first amount of the fluid.
According to one embodiment, a fluid flow controller is provided. The fluid flow controller comprises a fluid inlet to receive a flow of process fluid and a plurality of fluid outlets to provide the flow of process fluid to a plurality of device inlets. The plurality of fluid outlets include a first fluid outlet and at least one addition fluid outlet. The fluid flow controller further comprises a first input to receive a first signal indicative of an amount of the process fluid that is received at the fluid inlet, and a second input to receive a second signal indicative of a first predetermined portion of the amount of the process fluid that is to be provided to the first fluid outlet, with a remaining portion of the amount of process fluid being provided to the at least one additional fluid outlet.
According to another embodiment of the present invention, a fluid flow control system is provided that includes a fluid inlet to receive a flow of process fluid and a plurality of fluid outlets. The plurality of fluid outlets include a first fluid outlet and at least one second fluid outlet, the first fluid outlet providing a first predetermined portion of the flow of process fluid, and the at least one second fluid outlet providing a remaining portion of the flow of process fluid.
According to another embodiment of the present invention, a method of controlling a flow of process fluid is provided. The method includes acts of receiving the flow of process fluid at a fluid inlet, providing a first predetermined portion of the flow of process fluid to a first fluid outlet, and providing a remaining portion of the flow of process fluid to at least one second fluid outlet.
According to a further embodiment of the present invention, a fluid flow controller is provided. The fluid flow controller comprises a first input to receive a first signal indicative of an amount of process fluid received at a fluid inlet, a second input to receive a second signal indicative of a first predetermined portion of the received amount of the process fluid, and a first multiplier. The first multiplier receives the first signal and the second signal, multiplies the first signal by the second signal, and provides a first multiplied signal indicative of the first predetermined portion of the amount of process fluid, independent of the amount of the process fluid received at the fluid inlet.
REFERENCES:
patent: 2676603 (1954-04-01), Kollsman
patent: 4065250 (1977-12-01), Schliefer et al.
patent: 4345610 (1982-08-01), Herter et al.
patent: 4369031 (1983-01-01), Goldman et al.
patent: 4949670 (1990-08-01), Krogh
patent: 5013398 (1991-05-01), Long et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5415728 (1995-05-01), Hasegawa et al.
patent: 5453124 (1995-09-01), Moslehi et al.
patent: 5522934 (1996-06-01), Suzuki et al.
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5662143 (1997-09-01), Caughran
patent: 5702530 (1997-12-01), Shan et al.
patent: 5736457 (1998-04-01), Zhao
patent: 5772771 (1998-06-01), Li et al.
patent: 5865205 (1999-02-01), Wilmer
patent: 5911834 (1999-06-01), Fairbairn et al.
patent: 5916369 (1999-06-01), Anderson et al.
patent: 5951772 (1999-09-01), Matsuse et al.
patent: 5997950 (1999-12-01), Telford et al.
patent: 6012474 (2000-01-01), Takamoto et al.
patent: 6013155 (2000-01-01), McMillin et al.
patent: 6042687 (2000-03-01), Singh et al.
patent: 6068729 (2000-05-01), Shrotriya
patent: 6083569 (2000-07-01), Gupta et al.
patent: 6125859 (2000-10-01), Kao et al.
patent: 6162323 (2000-12-01), Koshimizu
patent: 6190233 (2001-02-01), Hong et al.
patent: 6210482 (2001-04-01), Kitayama et al.
patent: 6217659 (2001-04-01), Botelho et al.
patent: 6217937 (2001-04-01), Shealy
patent: 6287980 (2001-09-01), Hanazaki et al.
patent: 6294026 (2001-09-01), Roithner et al.
patent: 6321782 (2001-11-01), Hollister
patent: 6333272 (2001-12-01), McMillin et al.
patent: 6360762 (2002-03-01), Kitayama et al.
patent: 6418954 (2002-07-01), Taylor et al.
patent: 6422264 (2002-07-01), Ohmi et al.
patent: 6508913 (2003-01-01), McMillin et al.
patent: 6532978 (2003-03-01), Muller-Kuhrt et al.
patent: 6581623 (2003-06-01), Carpenter et al.
patent: 6631334 (2003-10-01), Grosshart
patent: 2002/0042205 (2002-04-01), McMillin et al.
patent: WO 00/31602 (2000-06-01), None
Lull John M.
Valentine William S.
Celerity Group, Inc.
Krishnamurthy Ramesh
Lowrie Lando & Anastasi, LLP
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