Method and apparatus for protecting a substrate surface from con

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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118715, 118722, 118723R, 118724, 20429801, C23F 102, C23C 1648, C23C 1428

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active

054725500

ABSTRACT:
An apparatus for processing a substrate surface in a process chamber wherein during chemical or physical altering of the substrate surface a laser beam is projected inside the processing chamber and along a trajectory which does not contact the substrate surface in order to capture particles by means of the photophoretic effect, particles which would otherwise impinge upon and contaminate the substrate surface.

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patent: 4664938 (1987-05-01), Walker
patent: 4685976 (1987-08-01), Schachameyer et al.
patent: 4828874 (1989-05-01), Hiraoka et al.
patent: 5205870 (1993-04-01), Sato et al.
patent: 5247190 (1993-09-01), Friend et al.
patent: 5328555 (1994-07-01), Gupta

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