Method and apparatus for proper ordering of registration data

Details Method and apparatus for proper ordering of registration data Method and apparatus for proper ordering of registration data

2005-05-31

2005-05-31

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000, C356S399000, C356S400000, C438S401000, C438S975000

Reexamination Certificate

active

06899982

ABSTRACT:
A photomask or reticle including a unique set of alignment attributes at separate and distinguishable field points is put in the reticle plane of a photolithographic projection system. The reticle pattern is exposed onto a resist coated wafer or substrate and processed through the final few steps of the photolithographic process. The resulting array of alignment attributes are then measured using a standard optical overlay metrology tool. The overlay tool is driven by a set of software instructions. By comparing the resulting overlay data to the placement error encoded on the reticle it can determined if the data has been read or displayed in the correct order.

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