Method and apparatus for projection exposure

Details Method and apparatus for projection exposure Method and apparatus for projection exposure

1993-03-17

1994-07-12

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, G03B 2752

Patent

active

053293355

ABSTRACT:
Disclosed are a projection exposure method which comprises the steps of projecting patterns of first and second photo mask elements by a light including a coherent component, each photo mask element having a pattern of a single-layer structure of one of the phase shift film and the light shielding film on a substrate disposed at a predetermined position such that an optically synthesized pattern of the two patterns is formed on the substrate, and controlling a phase of at least one of a first light portion which projects the pattern of the first photo mask element on the substrate and a second light portion which projects the pattern of the second photo mask element on the substrate, such that said first and second light portions have a predetermined phase difference therebetween and a projection exposure apparatus for carrying out the abovementioned method.

REFERENCES:
patent: 4734745 (1988-03-01), Ohta
patent: 5097291 (1992-03-01), Suzuki
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5246800 (1993-09-01), Muray
patent: 5253040 (1993-10-01), Kamon et al.
24th VLSI the Front of Lithography, Feb. 1991.

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