Method and apparatus for projecting a beam of electrically charg

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250398, A61K 2702

Patent

active

041829581

ABSTRACT:
Disclosed is an improvement of method and apparatus for varying the cross-section of a beam of electrically charged particles and projecting the so-varied beam onto the target. Passing through a plurality of apertured masks one after another, a beam of electrically charged particles is so deflected that the image of the overlapping area of the apertures of the masks appears on a target. According to this invention a beam of charged particles is deflected between two subsequent masks upstream so as to reduce the amount of beam current to that which is required in forming a desired image on the target, and the so-reduced beam is deflected between two subsequent masks downstream so as to trim and shape the cross-section of the beam into the exact and sharp contour as desired.
The method and apparatus for varying and projecting a beam of electrically charged particles according to this invention are particularly useful in producing microcircuits.

REFERENCES:
patent: 3326176 (1976-06-01), Sibley
patent: 3491236 (1970-01-01), Newberry
patent: 3876883 (1975-04-01), Broers et al.
patent: 4117340 (1978-09-01), Goto et al.

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