Method and apparatus for production and use of nanometer scale l

Details Method and apparatus for production and use of nanometer scale l Method and apparatus for production and use of nanometer scale l

1983-08-03

1987-05-05

Evans, F. L.

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

350319, 350507, G01N 2163

Patent

active

046627472

ABSTRACT:
An optical system for determining and reproducing spatial separation of features in the range of 80.ANG. to 2500.ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of between about 80.ANG. and 2500.ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.

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P. A. Ash and G. Nichols, "Super-resolution Aperture Scanning Microscope," pp. 510-512, Nature, vol. 237, Jun. 30, 1972.
Abstract "Scanning Optical Spectral Microscopy With 500.ANG. Spatial Resolution", Biophysical Journal, vol. 41, No. 2, Part 2, Feb. 1983, Lewis et al.

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