Gas and liquid contact apparatus – Fluid distribution – Valved
Patent
1982-12-20
1985-08-13
Chiesa, Richard L.
Gas and liquid contact apparatus
Fluid distribution
Valved
119 3, 119 5, 137510, 13762414, 210169, 2102212, 23953313, 261 62, 261121R, B01F 304
Patent
active
045349142
ABSTRACT:
A method and apparatus for producing vortex rings of a gas in a liquid. The apparatus includes: an accumulator including a gas outlet for discharging the gas and a gas inlet for introducing a gas from a gas supply source thereinto; a nozzle attached to the outlet of the accumulator in a communicating relation to the accumulator, the nozzle being of elasticity such that the nozzle is sealingly closed under liquid pressure when used; valve, connected to the accumulator, for permitting a gas supply from the gas supply source to the nozzle; and a mechanism for actuating the valve when gas pressure within the accumulator reaches predetermined pressure levels. In the method an accumulator is positioned in the liquid, and then the gas under pressure higher than that in the liquid surrounding the accumulator is supplied to the accumulator, from which the supplied gas is introduced into a nozzle communicated to the accumulator to open the nozzle against the pressure in the surrounding liquid. Then, in the nozzle there is formed a stream of the gas having a higher velocity at the center of the nozzle than that at the inner periphery of the nozzle so that a vortex ring of the gas is formed. The formed vortex ring is ejected from the nozzle into the liquid. The gas supply to the nozzle is stopped and thereby the nozzle is closed under the pressure in the surrounding liquid.
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Takahashi Masashi
Yamada Minoru
Chiesa Richard L.
Nihon Sanso Kabushiki Kaisha
Yamada Minoru
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