Method and apparatus for producing thin film of high to supercon

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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Details

20419211, 20419212, 20419224, 204298, 505816, H01L 3924, C23C 1434

Patent

active

048660329

ABSTRACT:
A thin film of a preselected compound having a large area is continuously produced on a substrate by depositing elements constituting the preselected compound from a target member onto the surface of a substrate by sputtering, comprising the steps of:

REFERENCES:
patent: 4046666 (1977-09-01), McClanahan et al.
patent: 4434037 (1984-02-01), Crank

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