Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-06-28
1998-03-10
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
378 35, G03F 900, G21K 500
Patent
active
057259747
ABSTRACT:
The invention provides a method for generating scanning data used to control a photomask production system for producing a photomask for use in semiconductor production so as to produce a photomask having a pattern corrected in terms of the optical proximity effects wherein it is possible to perform data processing and data conversion associated with the correction in terms of the optical proximity effects without introducing significant rounding errors, and it is possible to make correction in terms of the optical proximity effects without increasing the time required to produce the photomask, and furthermore it is possible to easily deal with a change in the process condition such as the resist exposure condition.
In the method for generating scanning data used to control the pattern exposing operation of a pattern exposure apparatus of the raster scanning type or of the vector scanning type so as to form a pattern on a photomask, wherein the pattern formed according to the above scanning data is corrected so that when a pattern is formed in a resist by exposing the resist to exposure light via the above-described pattern formed on the photomask, the deformation of the resultant pattern formed in the resist is minimized, the scanning data is generated by the process including the steps of: generating scanning data on the basis of mask data received from the outside; and correcting the scanning data produced in the previous step according to a predefined correction method thereby generating the corrected scanning data.
REFERENCES:
patent: 5202204 (1993-04-01), Kawahira et al.
patent: 5308991 (1994-05-01), Kaplan
Chapman Mark
Sony Corporation
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