Method and apparatus for producing magnetically oriented films o

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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118 50, 118500, 118722, 118730, 2041922, 427128, 4272555, 427294, 428694, 428900, B05D 314

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048492507

ABSTRACT:
A method and apparatus is disclosed for permitting a plurality of substrates to be positioned within a magnetic field unique to each substrate so that the plurality of substrates may be placed in a vacuum chamber and concurrently coated with a thin film. A magnetic field unique to and associated with each substrate may be oriented so that all substrates have a uniform magnetic field and magnetic orientation. Alternatively, the magnetic field and orientation of each substrate may be individually tailored to produce a different magnetic characteristic for each substrates.

REFERENCES:
patent: 3908194 (1975-09-01), Romankiw
J. K. Howard, Thin Films for Magnetic Recording Technology: A review; Jan.-Feb. 1986, J. Vac. Sci. Technol. A.
Yasuhiro Nagai and Tomoyuki Toshima, Magnetoresistance Effect of Ni-Fe Film Formed by Ion Beam Sputtering, Sep./Oct. 1986, J. Vac. Sci. Technol. A.
IBM Technical Disclosure Bulletin, vol. 27, No. 10B, Mar. 1985, Method of Manufacturing Thin Films with Magnetic Anisotropy.
IBM Technical Disclosure Bulletin, vol. 28, No. 3, Aug. 1985, Reverse Shunt Bias Thin Film Process.
T. R. McGuire and R. I. Potter, ANISOTROPIC MAGNETORESISTANCE IN FERROMAGNETIC 3RD ALLOYS, IEEE Transactions on Magnetics, Jul. 1975, pp. 1018-1038.

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