Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1990-11-29
1992-04-14
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20429841, 427 37, C23C 404
Patent
active
051045095
ABSTRACT:
A method of producing layers of hard carbon modifications on a substrate includes disposing the substrate in a vacuum chamber in which an anode electrode and a cathode electrode are disposed and spaced from one another. The anode electrode is made of a carbon containing material and serves as a carbon source when a direct current is formed between the spaced electrodes. The two electrodes are energized, thereby forming a direct current arc in the vacuum between the spaced electrodes; and hydrogen is introduced directly into the region of the arc by flowing hydrogen through at least one of the two electrodes while simultaneously maintaining the arc between the electrodes to feed the arc with carbon from the anode thereby coating a surface of the substrate with a hard carbon layer.
REFERENCES:
patent: 3931542 (1976-01-01), Sheer et al.
patent: 4645895 (1987-02-01), Boxman et al.
patent: 4851254 (1989-07-01), Yamamoto et al.
patent: 4917786 (1990-04-01), Ehrich
Japanese Journal of Applied Physics, vol. 27, No. 9, Sep. 1988, pp. L1600-L1602, "Rapid Growth of Diamond Films by Arc Discharge Plasma CVD", Fumio Akatsuka et al.
Buck Volker
Schlump Wolfgang
Willbrand Jurgen
Fried. Krupp GmbH
Weisstuch Aaron
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