Pumps – One fluid pumped by contact or entrainment with another – Jet pump with motive fluid generating pump
Patent
1988-06-27
1989-11-14
Croyle, Carlton R.
Pumps
One fluid pumped by contact or entrainment with another
Jet pump with motive fluid generating pump
417158, F04B 2314
Patent
active
048803570
ABSTRACT:
A method and apparatus for obtaining sub-atmospheric pressures including a venturi tube having a first end and a second end, a nozzle located in the first end of the venturi tube for spraying fluids, a collection chamber connected to the second end of the venturi tube for receiving fluids sprayed from the nozzle, a vacuum chamber connected to the first end of the venturi tube, an outlet connected to the collection chamber for removing fluids from the collection chamber, and a pump connected to the outlet for pumping fluids from the outlet to the nozzle.
REFERENCES:
patent: 246149 (1881-08-01), Kind
patent: 929674 (1909-08-01), Koerting
patent: 1367865 (1921-02-01), Crawford
patent: 1791292 (1931-02-01), Smith
patent: 1791513 (1931-02-01), Slocum
patent: 2085361 (1937-06-01), Hellmer
patent: 2183623 (1939-12-01), Ross
patent: 2375180 (1945-05-01), Vigo
patent: 2452421 (1948-10-01), Ames
patent: 3064878 (1962-11-01), Bayles et al.
patent: 3315879 (1967-04-01), Jennings
patent: 3369735 (1968-02-01), Hoffmeister
patent: 3545886 (1970-10-01), Chalom
patent: 3551074 (1970-12-01), Stout
patent: 3830064 (1974-08-01), Bronicki
patent: 4505645 (1985-03-01), Laguilharre
patent: 4580948 (1986-04-01), Schmidlin
patent: 4632649 (1986-12-01), Segebrecht et al.
Blackmon Robert N.
Croyle Carlton R.
Ray David L.
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