Method and apparatus for producing halogen

Details Method and apparatus for producing halogen Method and apparatus for producing halogen

1983-12-08

1985-03-05

Douglas, Winston A.

Chemistry: electrical and wave energy

Processes and products

204128, 204228, 204277, 204278, 204DIG4, 429101, C25B 134

Patent

active

045029288

ABSTRACT:
A halogen production apparatus comprising a halogen production device and a metal-halogen secondary cell which contains in its electrolyte the same halogen as is produced by the production device. Drive power is supplied to the production device from a commercial power terminal. Charging power is supplied from the commercial power terminal to the secondary cell during a first period of time, for example, during a period of time in which the power cost is low. During this period of time, the halogen produced by the secondary cell is added to the halogen produced by the production device. During a second period of time different from the first period, for example, during a period of time in which the power cost is high, the power generated by the secondary cell is supplied to the production device while a portion of the halogen produced by the production device is being supplied to the electrolyte of the secondary cell.

REFERENCES:
patent: 3484617 (1969-12-01), Winsel
patent: 3622490 (1971-11-01), Lockett et al.
patent: 4080271 (1978-03-01), Brown
patent: 4217187 (1980-08-01), Tufts et al.
patent: 4310396 (1982-01-01), Demair/e/ et al.
patent: 4343868 (1982-08-01), Putt
patent: 4415413 (1983-11-01), Veber
patent: 4459187 (1984-07-01), Lagan/a/ et al.

Affiliated with

Also associated with

Rating

Method and apparatus for producing halogen does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for producing halogen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for producing halogen will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1732967