Method and apparatus for producing biaxially oriented thin...

Details Method and apparatus for producing biaxially oriented thin... Method and apparatus for producing biaxially oriented thin...

2006-02-16

2010-11-09

Kornakov, Michael (Department: 1714)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C117S084000, C250S398000, C250S492300

Reexamination Certificate

active

07829156

ABSTRACT:
A method and an apparatus serve to produce thin films having a biaxial crystal orientation. The method includes the steps of: depositing atoms on a substrate, the atoms having a composition corresponding to the thin film to be produced; bombarding the deposited atoms with an energized beam, the energized beam being oriented with respect to the substrate at an angle of a defined range of angles, the step of bombarding substantially taking place during a different time period than the step of depositing; and alternately repeating the step of depositing and the step of bombarding for a plurality of times.

REFERENCES:
patent: 5432151 (1995-07-01), Russo et al.
patent: 7012275 (2006-03-01), Balachandran et al.
patent: 2001/0006042 (2001-07-01), Iijima et al.
patent: 2002/0073918 (2002-06-01), Reade et al.

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