Radiant energy – Ion generation – Field ionization type
Patent
1994-07-26
1996-03-05
Berman, Jack I.
Radiant energy
Ion generation
Field ionization type
250424, 250426, 250427, 2504422, H01J 2700
Patent
active
054970059
ABSTRACT:
The invention relates to a method and a generator for producing an aluminum ion flow, specifically for aluminum ion implantation in the microelectronics industry. The method includes the following steps: (i) supplying a stream of an ionization gas into the ionization chamber; (ii) providing an amount of an aluminum-containing feed material inside the ionization chamber; (iii) generating, within the ionization chamber, an electron flow by supplying an electrode with a large current; (iv) bombarding the ionization gas stream with the electron flow to create a plasma; (v) causing the plasma to attack the feed material so as to become enriched with aluminum ions; (vi) taking the plasma out of the ionization chamber; (vii) removing from the plasma, by application of a magnetic field, those ions which have a significantly different equivalent weight from the equivalent weight of the aluminum ions; all this having selected the ionization gas and feed material such that, in the plasma taken out of the ionization chamber, there will be aluminum ions present along with other ions, all having different equivalent weights from the equivalent weight of the aluminum ions.
REFERENCES:
patent: 5262652 (1993-11-01), Bright et al.
Patent Abstracts of Japan, vol. 10, No. 50 (E-284) Feb. 27, 1986 & JP-A-60205951 (Hitachi).
Medulla Candido
Raspagliesi Mario
Berman Jack I.
Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno
Driscoll David M.
Morris James H.
Nguyen Kiet T.
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