Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-07-03
2007-07-03
Visconti, Geraldina (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S329000, C430S330000
Reexamination Certificate
active
10401563
ABSTRACT:
In a method of producing a photomask blank, comprising a thin film forming step of forming, on a rectangular substrate, a thin film for causing an optical change in exposure light, a resist application step of applying a positive resist on the thin film, a baking step of heat treating the resist applied on the thin film, and a removing step of removing a resist film formed in a portion of the edge of the substrate, the removing step is carried out by exposing the resist film in the portion of the edge of the substrate after the resist application step and before the heat treating step so that, upon development subsequently carried out in the removing step, a difference in solubility or dissolving speed in a developer is obtained between an exposed area and an unexposed area and by selectively supplying the developer to the exposed area.
REFERENCES:
patent: 5869211 (1999-02-01), Koshiishi
patent: 6485869 (2002-11-01), Tsai et al.
patent: 2003/0180633 (2003-09-01), Sato et al.
patent: 57-13863 (1982-03-01), None
patent: 63-160332 (1988-07-01), None
patent: 2001-259502 (2001-09-01), None
Asakawa Keishi
Kobayashi Hideo
Hoya Corporation
Sughrue & Mion, PLLC
Visconti Geraldina
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