Method and apparatus for producing a high-purity titanium

Details Method and apparatus for producing a high-purity titanium Method and apparatus for producing a high-purity titanium

1992-09-09

1994-08-09

Gorgos, Kathryn

Chemistry: electrical and wave energy

Processes and products

204243R, 75612, 75621, 419 61, C25C 328

Patent

active

053363787

ABSTRACT:
A sputtering target for forming a thin film consisting of high-purity titanium, in which the content of alkali metal is 0.1 ppm or less, the content of radio active elements is 1 ppb or less, and the oxygen content is 100 ppm or less, and, further, the balance of the elements is Ti, is produced by a fused salt electrolysis, in which the members of the electrolytic cell being in contact with the fused salt consist of Ni.

REFERENCES:
patent: 2939823 (1960-06-01), Rand
patent: 2944949 (1960-07-01), Leech
patent: 3114685 (1963-12-01), Alpert
patent: 4090924 (1978-05-01), Bon
patent: 4118291 (1978-10-01), Juckniess et al.
patent: 4165262 (1979-08-01), Juckniess et al.
patent: 4686025 (1987-08-01), Cohen et al.
patent: 5054421 (1991-10-01), Ito et al.

Affiliated with

Also associated with

Rating

Method and apparatus for producing a high-purity titanium does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for producing a high-purity titanium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for producing a high-purity titanium will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-213970