Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1992-07-30
1993-09-14
Bennet, Henry A.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34 57A, F26B 1700
Patent
active
052437671
ABSTRACT:
The present invention relates to a method and apparatus for drying particulate materials such as seeds and grains in which an air dryer having a shape of a vertical, cylinder and at least one drying stage with a mesh screen disposed therein with a horizontal mesh screen. An upwardly vertical air flow having a velocity in the mesh openings at least equal or larger than to the suspension speed of the particles to be dried temporarily suspends the particles until enough accumulate to provide sufficient weight or downward pressure for the particles to overcome the upward air flow, pass downward through one or more mesh screens and reach the bottom of the dryer.
REFERENCES:
patent: 1783965 (1930-12-01), Jackson
patent: 2299299 (1942-10-01), Bills
patent: 2458356 (1949-01-01), Evans
patent: 2532335 (1950-12-01), Royster
patent: 2581134 (1952-01-01), Odell
patent: 2676668 (1954-04-01), Lindsay
patent: 2777760 (1957-01-01), Dineen et al.
patent: 2893849 (1959-07-01), Krebs
patent: 3052990 (1962-09-01), Tailor
patent: 3263346 (1966-08-01), Vandenhoeck
patent: 3511843 (1970-05-01), Lewis
patent: 3559299 (1971-02-01), Tyler
patent: 3648753 (1978-03-01), Bergquist
patent: 4021927 (1977-05-01), Idaszak
patent: 4030205 (1977-06-01), Robertson et al.
patent: 4800653 (1989-01-01), Steffen
patent: 5158754 (1992-10-01), Lefers et al.
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