Method and apparatus for processing exhaust gas produced during

Details Method and apparatus for processing exhaust gas produced during Method and apparatus for processing exhaust gas produced during

1998-09-25

2000-07-18

Simmons, David A.

Gas separation: processes

Difference in molecular velocity, density, or momentum of...

Centrifugal force

95270, 95282, 55320, 55329, 55333, 55477, B01D 3315

Patent

active

060901837

ABSTRACT:
A method for processing an exhaust gas produced during manufacturing of semiconductor devices including the steps of introducing a thermally disintegrable or thermally oxidizable exhaust gas produced during manufacturing of semiconductor devices into a processing chamber; heating up this exhaust gas in the processing chamber so that the exhaust gas undergoes thermal disintegration or thermal oxidation and becomes harmless and easy to handle for further processing; capturing fine particles of solid oxides or the like suspended inside the processing chamber with a sweeper provided inside the processing chamber; and sweeping fine particles of solid oxides or the like accumulated on a wall of the processing chamber with the sweeper.

REFERENCES:
patent: 5462585 (1995-10-01), Niskanen et al.
patent: 5536298 (1996-07-01), Awaji
patent: 5562758 (1996-10-01), Awaji
patent: 5649985 (1997-07-01), Imamura
patent: 5716428 (1998-02-01), Imamura
patent: 5900043 (1999-05-01), Grandjean et al.

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