Method and apparatus for processing errors occurring upon divisi

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364488, 2504923, H01J 3730

Patent

active

051776928

ABSTRACT:
In an apparatus for depicting a pattern with a beam of electrically charged particles, error making appearance upon division of a pattern into a plurality of subpatterns each of a size suited for irradiation with a predetermined resolution is suppressed by adding a first coordinate of one of the adjacent subpatterns which is deviated from the origin serving as a reference point by a given distance with a half value of the predetermined resolution to thereby produce a first sum value whose fractional part smaller than the resolution is rounded off to thereby obtain a first output value representing the origin, whereon the first output value is subtracted from the first coordinate to obtain a second output value which is then added to a length of a side of the one subpattern extending from the first coordinate in the diretion to which the first coordinate belongs to thereby obtain a second sum value. Finally, the second sum value and the half value of the resolution are added together to produce a third sum value whose fractional part smaller than the resolution is then rounded off, to obtain a second coordinate which delimits the side in cooperation with the first coordinate.
A series of first and second coordinates are used to create a plurality of lines. These lines are then used to divide the pattern into a series of corrected subpatterns.

REFERENCES:
patent: 4812962 (1989-03-01), Witt
patent: 4878177 (1989-10-01), Ikenaga et al.
patent: 4950910 (1990-08-01), Yasuda et al.
patent: 5086398 (1992-02-01), Moriizumi
"Electron-Beam Proximity Printing--A New High-Speed Lithography Method for Submicron Structures" by H. Bohlen et al., IBM J. Res. Develop., vol. 26, No. 5, Sep. 1982, pp. 568-579.

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