Method and apparatus for processing a specimen

Details Method and apparatus for processing a specimen Method and apparatus for processing a specimen

1996-12-09

1999-03-23

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

156345, H01J 37285

Patent

active

058853545

ABSTRACT:
The invention relates to a method and to apparatus for processing a specimen, particularly an integrated circuit, in which an area of the specimen to be processed is scanned with a corpuscular beam and at least one gas is supplied above the area to be processed so that with the aid of the corpuscular beam a chemical reaction takes place on the area to be processed. The processing speed can be markedly increased by the use of a magnetic field in the region of the probe.

REFERENCES:
patent: 3931517 (1976-01-01), Coates et al.
patent: 4394282 (1983-07-01), Seiver
patent: 4472636 (1984-09-01), Hahn
patent: 5345207 (1994-09-01), Gebele
patent: 5413663 (1995-05-01), Shimizu et al.
Shinji Matsui, Toshinari Ichihashi, and Masanobu Mito: "Electron beam indd selective etchin and deposition technology" J. Vac. Sci. Technol. B, vol. 7, No. 5 Sep./Oct. 1989.

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