Method and apparatus for processing a micro sample

Details Method and apparatus for processing a micro sample Method and apparatus for processing a micro sample

2007-02-15

2008-12-30

Hughes, James P (Department: 2883)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492210, C250S492300

Reexamination Certificate

active

07470918

ABSTRACT:
An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

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