Method and apparatus for process monitoring and control

Details Method and apparatus for process monitoring and control Method and apparatus for process monitoring and control

2008-04-08

2008-04-08

Kim, Robert (Department: 2881)

Radiant energy

Ionic separation or analysis

With sample supply means

C250S424000

Reexamination Certificate

active

10501558

ABSTRACT:
A method and apparatus for real-time monitoring of a gaseous environment during a semiconductor process. The method utilizes metastable electronic energy transfer to excite and ionize the chamber gaseous effluent and correlates the fluorescence signals from the excited species and mass spectroscopy analysis of the ions generated with the process status. In addition to the ability to produce excited species that fluoresce, the method has the ability to generate molecular ions from labile compounds, reduce fragmentation and operate at higher pressures than conventional ionization methods.

REFERENCES:
patent: 5248636 (1993-09-01), Davis et al.
patent: 6124675 (2000-09-01), Bertrand et al.
patent: 6750449 (2004-06-01), Marcus
patent: 6791692 (2004-09-01), Powell et al.
patent: 2001/0055649 (2001-12-01), Ogure et al.
patent: 2002/0016077 (2002-02-01), Hwangbo et al.
Mendecino, et al. “EHS analysis of advanced CVD processes,” SEMICON West Treatment Technologies for Engineering, 2001 http://dom.semi.org.
Polini, et al. “Raman spectroscopy characterization of diamond films on steel substrates with titanium carbide arc-plated interlayer,” Thin Solid Films 515 (2006) 1011-1016 Avaliable online through Science Direct www.sciencedirect.com.

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