Method and apparatus for process control

Boots – shoes – and leggings

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

364162, 364180, 364476, G05B 1902

Patent

active

047455411

ABSTRACT:
A method and apparatus are provided for producing a control signal by digital computation for controlling an element affecting a process. The process is described by a sequence of activities, and the onset of each activity is marked by a predetermined change of a process parameter. An event detector is provided for detecting the occurrence of predetermined changes of process parameters in response to data included within event detector data blocks. The event detector data blocks include data defining the desired response to the detection of a predetermined change of a process parameter. The control signal is produced in accordance with a selected predetermined algorithm using data included in algorithm data blocks. A first event detector data block and a first algorithm data block are selected defining a first predetermined change of a process parameter and a first algorithm. Upon detection of the first predetermined change, of a process parameter, a second predetermined change of a process parameter is selected in accordance with data included within the first selected event detector data block and a second algorithm data block is selected defining a second algorithm.

REFERENCES:
patent: 3859400 (1975-01-01), Ma
patent: 4215397 (1980-07-01), Hom
patent: 4363090 (1982-12-01), Garcia
patent: 4486830 (1984-12-01), Taylor, Jr. et al.
patent: 4558430 (1985-12-01), Mogami
patent: 4587470 (1986-05-01), Yamawaki
patent: 4642760 (1987-02-01), Yonai et al.
patent: 4663704 (1987-05-01), Jones et al.
patent: 4683549 (1987-07-01), Takaki
patent: 4689736 (1987-08-01), Glaudel et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for process control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for process control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for process control will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1885519

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.