Method and apparatus for preventing particle contamination in a

Details Method and apparatus for preventing particle contamination in a Method and apparatus for preventing particle contamination in a

1996-07-29

1999-03-30

Bueker, Richard

Coating processes

Measuring, testing, or indicating

4272481, 4272552, 216 59, 118692, 118715, 156345, C23C 1600

Patent

active

058885790

ABSTRACT:
The present invention is concerned with a method and apparatus for preventing particle contamination in a semiconductor process chamber wherein a contaminant purge system is utilized which has a first end connected in fluid communication with a conduit connecting between a pressure sensor and a manifold, and a second end connected in fluid communication with an exhaust system such that a purge gas carries contaminant particles from the conduit to the exhaust system and away from the process chamber.

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