Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-01-30
1999-05-25
Anderson, Bruce
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2505051, H01J 3731
Patent
active
059071575
ABSTRACT:
A method and apparatus for preparing a specimen adapted for electron microscopy comprises an evacuated specimen-processing chamber. A specimen having a surface to be processed is placed inside the processing chamber A beam-blocking member is placed close to the processed surface so as to block a part of an etching beam A first etching step is performed by directing the beam at the specimen via the blocking member. Then, the specimen and the blocking member are moved relative to each other. Finally, a second etching step is performed by directing the beam at the specimen via the blocking member. As a result, the specimen becomes a thin film and it can be observed with the electron microscope.
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Kihara Harumi
Naruse Mikio
Yoshioka Tadanori
Anderson Bruce
Jeol Ltd.
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