Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-12-11
1998-08-04
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, G03F 900
Patent
active
057891184
ABSTRACT:
An attenuating phase metrology cell on a reticle comprising an attenuating feature and a binary feature. The metrology cell is used to determine amount of focal shift associated with the attenuating phase-shifting material. A dimension of an image of the attenuating feature is measured at a number of focal distances from the reticle. Thereafter a first relationship between the measurements of the attenuating feature and the focal distance is determined. A dimension of an aerial image of the binary feature is also measured at a number of focal distances from the reticle. The relationship between the measurements of the binary feature and focal distance is determined. An amount of focal shift is then determined based upon the first and second relationships. The attenuating metrology pattern can thus be included on an attenuating phase-shifting reticle, such that the focal shift of the attenuating phase-shifting reticle can be determined.
REFERENCES:
patent: 4231811 (1980-11-01), Somekh et al.
patent: 4881257 (1989-11-01), Nakagawa
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5049925 (1991-09-01), Aiton et al.
patent: 5229255 (1993-07-01), White
patent: 5300377 (1994-04-01), Keum
patent: 5300379 (1994-04-01), Dao et al.
patent: 5302477 (1994-04-01), Dao et al.
patent: 5326659 (1994-07-01), Liu et al.
patent: 5348826 (1994-09-01), Dao et al.
patent: 5354632 (1994-10-01), Dao et al.
patent: 5387485 (1995-02-01), Sukegawa et al.
patent: 5439767 (1995-08-01), Yamashita et al.
patent: 5455144 (1995-10-01), Okamoto et al.
patent: 5527647 (1996-06-01), Doi et al.
K. Nakagawa, N. Ishiwata, Y Yanagishita, Y. Tabata, "The Japan Society of Applied Physics and Related Societies" Extended Abstracts, 29p-ZC-2, Mar. 1991.
K. Nakagawa, N. Ishiwata, Y Yanagishita, Y. Tabata, "The Japan Society of Applied Physics and Related Societies" Extended Abstracts, 29p-ZC-3, May 1991.
Burn J. Lin,IBM General Technology Division, "The Attenuated Phase-Shifting Mask", Solid State Technology, Jan. 1992 pp. 44-47.
Andrew R. Neureuther, BACUS Symposium Paper, Department of Electrical Engineering and Computer Sciences, UC Berkeley, CA "Modeling Phase Shifting Masks", Mar. 1990, pp. 1-6 and Figures 1-13.
H. Ohtsuka, K. Abe, T. Onodera, K. Kuwahara, "Conjugate Twin-Shifter For The New Phase Shift Method To High Resolution Lithography", V-LSI R&D Center, OKI Electric Industry Co., LTD SPIE vol. 1463 Optical/Laser Microlithography IV, May 1991, pp. 112-123.
Dao Giang T.
Liu Gang
Snyder Alan M.
Intel Corporation
Rosasco S.
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