Method and apparatus for precision control of galvanometer patte

Details Method and apparatus for precision control of galvanometer patte Method and apparatus for precision control of galvanometer patte

1992-10-13

1994-06-21

Willis, Davis L.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

25023116, G01D 530

Patent

active

053229991

ABSTRACT:
A method and apparatus for precise control of a galvanometer patterning system is provided in which a patterning beam (12) is deflected off of a galvanometer mirror (14) toward a work piece (10). The position of the galvanometer mirror (14) is determined by generating a measurement beam (20), transmitting it through a cylinder lens (26) and deflecting it off of the galvanometer mirror (14). The deflected measurement beam (20) is filtered through grating filter (28) having two side-by-side gratings. Light passing through the side-by-side gratings filter (28) is focused on a detector (36) through an anamorphic condenser (32 and 34).

REFERENCES:
patent: 4490608 (1984-12-01), Yeadon et al.
patent: 4835704 (1989-05-01), Eichelberger et al.

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