Method and apparatus for pre-processing of semiconductor substra

Details Method and apparatus for pre-processing of semiconductor substra Method and apparatus for pre-processing of semiconductor substra

1998-09-03

2000-12-26

Williams, Hezron

Measuring and testing

Miscellaneous

73DIG1, 134 13, 134 951, 134902, 134105, 134155, B08B 304

Patent

active

061641332

ABSTRACT:
A semiconductor substrate surface analysis pre-processing apparatus has a substrate section which holds a decomposition/collecting liquid that is caused to come into contact with the entire surface of a substrate to be surface-analyzed, a substrate transport section which holds the substrate to be surface-analyzed, and which moves the substrate between a substrate carrier and the substrate processing section, a supply and ejection means for the decomposition/collecting liquid, and a processing operation means that performs either ultrasonic or heat processing with respect to the substrate processing section.

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patent: 5487398 (1996-01-01), Ohmi et al.
patent: 5733434 (1998-03-01), Harada et al.
patent: 5872046 (1999-02-01), Kaeriyama et al.
patent: 5922136 (1999-07-01), Huang
patent: 6039814 (2000-03-01), Ohmi et al.

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