Method and apparatus for polishing a substrate

Details Method and apparatus for polishing a substrate Method and apparatus for polishing a substrate

2006-10-03

2006-10-03

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S057000, C451S278000

Reexamination Certificate

active

07115022

ABSTRACT:
The present invention is to provide a method and device for polishing a glass substrate, suitable for polishing a large-sized glass substrate.The device for polishing a substrate is adapted so that a substrate is attached to a film stretched on a frame; the frame is installed on a carrier; the carrier and a polishing surface-plate are brought closer relative to each other to polish a surface to be polished of the substrate attached to the film by pressing the substrate to the polishing surface-plate; the frame is removed from the carrier after the completion of the polishing, and the polished substrate is removed from the frame.

REFERENCES:
patent: 6062949 (2000-05-01), Yashiki et al.
patent: 6935930 (2005-08-01), Fujita
patent: 4-99321 (1992-03-01), None
patent: 6-302569 (1994-10-01), None
patent: 10-294298 (1998-11-01), None
patent: 11-254308 (1999-09-01), None
patent: 2000-33558 (2000-02-01), None
patent: 2000-129227 (2000-05-01), None
patent: 2001-274121 (2001-10-01), None
patent: 2001-291689 (2001-10-01), None
patent: WO 99/33614 (1999-07-01), None

Affiliated with

Also associated with

Rating

Method and apparatus for polishing a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for polishing a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for polishing a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3715220