Method and apparatus for plating metals

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Involving measuring – analyzing – or testing

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205103, 205104, 205105, 205106, 205107, 205108, 204406, 204434, 204400, 204DIG9, 204228, C25D 2112, C25D 518, C25D 550, G01N 2726

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056056150

ABSTRACT:
A method and apparatus for plating metals which delivers a voltage pulse with the possibility of a widely varying current magnitude characteristic to a plating electrode and an object having a large electrical reactance in terms of a parallel resistance and capacitance in order to raise the voltage potential between the electrode and an object to a programmed plating voltage overpotential and underpotential. The programmed plating voltage overpotential determines how fast the electrochemical reaction is allowed to proceed in the diffusion layer, and the programmed voltage underpotential determines how quickly the electrochemical reaction of the diffusion layer will slow down.

REFERENCES:
patent: 4018658 (1977-04-01), Alfin et al.
patent: 4065374 (1977-12-01), Asami
patent: 4120759 (1978-10-01), Asami
patent: 4461680 (1984-07-01), Lashmore
patent: 5156729 (1992-10-01), Mahrus et al.
Bahnck et al., "Bipolar, Constant-Current, Electroplating Power Supply", Western Electric Technical Digest, No. 29 (Jan. 1973), pp. 5-6.
Cohen et al., "A Microprocessor Controlled Potentiostat for Electrochemical Measurements", Journal of Research, vol. 83, No. 5 (Sep.-Oct. 1978), pp. 429-443.
J. Puippe et al., "Theory and Practice of Pulse Plating" published by American Electroplaters and Surface Finishers Society, 1986, pp. 1, 2, 5, 8, 23, 38, 43, 52, 53, and 124 no month.
Lowenheim, Electroplating, no month, 1978, p. 140.
Harris, Quantitative Chemical Analysis, no month, 1982, pp. 424-426.
Jernstedt, "Better Deposits at Greater Speeds by PR Plating", pp. 1-6. Jul. 1948.

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