Method and apparatus for plasma treatment

Liquid purification or separation – Processes – Liquid/liquid solvent or colloidal extraction or diffusing...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

210104, 210110, 2102572, 210259, 210295, 21032165, 210434, 210744, 210782, 210805, B01D 1300, B01D 17038

Patent

active

047479523

ABSTRACT:
Separation apparatus capable of separating plasma into high molecular weight substances and low molecular weight substances containing albumin, regardless of whether plasma is obtained by separation of corpuscular components in a continuous centrifugal separator or in a batch-type centrifugal separator. The apparatus comprises a filtration membrane module, a plasma feeding circuit connecting the centrifugal separator with the filtration membrane module, a plasma return circuit for returning to a patient purified plasma freed of high molecular weight substances, a supplemental fluid circuit for supplying additional fluid to the plasma return circuit, and a condensed plasma discharge circuit for disposal of high molecular weight substances. The apparatus is controlled independently of the centrifugal separator.

REFERENCES:
patent: 3814249 (1974-06-01), Eaton
patent: 3830234 (1974-08-01), Kopp
patent: 4013564 (1977-03-01), Nose
patent: 4243532 (1981-01-01), Tsuda et al.
patent: 4350156 (1982-09-01), Malchesky
patent: 4350594 (1982-09-01), Kawai et al.
patent: 4397747 (1983-08-01), Ikeda
Malchesky, P. S. et al, "On-Line Separation . . . ", Art. Organs, vol. 4, No. 3, pp. 205-207, Aug. 1980.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for plasma treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for plasma treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for plasma treatment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1872809

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.