Method and apparatus for photolithography by rotational scanning

Details Method and apparatus for photolithography by rotational scanning Method and apparatus for photolithography by rotational scanning

1994-08-09

1997-03-11

Phan, James

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359823, G02B 2608

Patent

active

056107544

ABSTRACT:
A photolithography method copies a pattern plane onto a working plane by a rotating imaging system. The pattern plane is parallel to the working plane. At a given instance, the imaging system images a small region of the pattern plane to the working plane. The imaging system rotates around a fixed axis perpendicular to the pattern plane and on each pass copies a circular arc shaped region from the pattern plane to the working plane. Synchronized translation of the pattern plane and working plane in conjunction with rotation of the imaging system allows the entire pattern plane to be copied to the working plane. The photolithography method can achieve high resolution over a large field-of-view with high write speed and can include an autofocus system to account for variation in the flatness of the working plane. This photolithography method can be used in the visible, UV, IR or x-ray wavebands.

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PS, "Array lens technology targets FPD manufacturing", Apr., 1994, Semiconductor International, p. 15.
David Holbrook, "Microlithgraphy for large area flat panel display substrates", Solid state technology, May 1992, p. 166-172.

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