Coating processes – Electrical product produced – Welding electrode
Patent
1986-04-09
1987-05-26
Newsome, John H.
Coating processes
Electrical product produced
Welding electrode
427 541, 427140, B05D 306
Patent
active
046685286
ABSTRACT:
The invention relates to visible-laser deposition reactions of metal containing oxyhalide vapors, such as, chromyl chloride vapor, CrO.sub.2 Cl.sub.2, for direct writing of metal containing opaque oxide patterns on various substrates (S.sub.i, S.sub.i O.sub.2, GaAs and glass). Deposition at low laser power is by photolyses of adsorbed reactant molecules. Higher powers initiate deposition photochemically and continue it with a combined photolytic/pyrolytic reaction, simultaneously inducing a solid-phase conversion of the deposited film. Mixed Cr.sub.2 O.sub.3 /CrO.sub.2 thin films of 1-nanometer to several-micrometer thickness, as well as 1-millimeter-long single crystals of Cr.sub.2 O.sub.3, can be grown with this process, the latter at rates up to 3 .mu.m/s. Thin chromium oxide films produced in this manner are strongly ferromagnetic. Mass spectrometer and optical transmission measurements show that surface kinetics dominate the nucleation and growth rates. The method and apparatus is particularly suitable for repair of photomasks.
REFERENCES:
patent: 3619288 (1971-11-01), Sirtl
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4435445 (1984-03-01), Allred et al.
patent: 4505949 (1985-03-01), Jelks
"Synthesis and Properties of Ferromagnetic Chromium Oxide", Swoboda et al., Journal of Applied Physics, Supplement to vol. 32, No. 3, Mar. 1961.
"Decomposition of Higher Oxides of Chromium Under Various Pressures of Oxygen", Kubota, B., J. Am. Ceram. Soc., 44, 239, (1961).
"A Flash-Photolysis Study of Chromyl Chloride", Halonbrenner et al., J. Phys. Chem., 72, vol. 78, No. 11, Oct. 1968.
"Magnetic and Magneto-Optic Properties of FeRh and CrO.sub.2 ", Stoffel, J. Appl. Phys. 40, Mar. 1969.
"Low Pressure Growth and Properties of CrO.sub.2 on Al.sub.2 O.sub.3 ", Ben-Dor et al., J. Crystal Growth 24/25, (1974).
"Emission Spectroscopy and Excited-State Dynamics of Chromyl-Chloride Vapor", McDonald, J. R., Chemical Phys. 9, (1975).
"Magnetism and Magnetic Materials-1976, American Institute of Physics Conf. Proc. No. 34, J. J. Becker & G. H. Lander.
"Lead-Induced Vapor Deposition of Silicon", Hanabusa et al., App. Phys. Lett. 35(8), Oct. 15, 1979.
"Laser Diagnostics and Photochemical Processing for Semiconductor Devices", Materials Research Society Symposia Proceedings, vol. 17, Nov. 1982, Editors: Osgood et al.
"Visible-Laser Repair of Clear Defects in Photomasks", Opryski et al., IEEE Electron Device Letters, vol. EDL-6, No. 7, Jul. 1985.
Arnone Claudio
Ehrlich Daniel J.
Rothschild Mordecai
Massachusetts Institute of Technology
Newsome John H.
LandOfFree
Method and apparatus for photodeposition of films on surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for photodeposition of films on surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for photodeposition of films on surfaces will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-702923