Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1999-05-07
2000-12-19
Adams, Russell
Photocopying
Projection printing and copying cameras
Step and repeat
356399, 250458, 355 67, 355 71, G03B 2742, F21V 916, G01B 1100
Patent
active
061633682
ABSTRACT:
A method and apparatus for printing a feature having a reduced critical dimension on a photoresist-coated semiconductor wafer are disclosed. The method comprises the steps of positioning the wafer relative to the reticle at a first shifted position, exposing a first region of the wafer to radiant energy through a pattern transfer tool to define a first side of the feature, positioning the wafer relative to the pattern transfer tool at a second shifted position, and exposing a second region of the wafer to radiant energy through the pattern transfer tool to define a second side of the feature.
REFERENCES:
patent: 5281996 (1994-01-01), Bruning et al.
patent: 5503959 (1996-04-01), Langston
patent: 5646413 (1997-07-01), Nishi
patent: 5663784 (1997-09-01), Tanimoto
patent: 5677754 (1997-10-01), Makinouchi
patent: 5699146 (1997-12-01), Kaminaga
Silicon Processing For The VLSI Era, vol. 1-Process Technology, S. Wolf and R.N. Tauber, pp. 407-492, 1986.
"Product Description for the Micrascan II", pp. 1-1-4-4, Nov. 11, 1994.
"The Ultimate Lithography Solution For 0.5 .mu.m to 0.25 .mu.m", 4 pages, 1992.
Adams Russell
Brown Khaled
Intel Corporation
LandOfFree
Method and apparatus for performing a double shift print on a su does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for performing a double shift print on a su, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for performing a double shift print on a su will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-275238