Image analysis – Applications – Manufacturing or product inspection
Patent
1997-06-27
1998-07-28
Mancuso, Joseph
Image analysis
Applications
Manufacturing or product inspection
438 10, 438 17, H01L 2166
Patent
active
057871906
ABSTRACT:
An automated system and procedure processes wafer test bin data of semiconductor wafers to formulate a fault pattern at statistically significant levels. A processor such as a neural engine or neural network collects wafer test bin results to generate a N/N wafer map to be correlated with wafer maps produced from a wafer electrical test, a wafer level reliability test, and an in-line defect analysis. A N/N wafer map generated by the processor is cross-checked with a wafer map generated from another semiconductor tester to formulate possible overlap fault patterns. The confirmed fault patterns are further analyzed by performing failure analysis to find the root cause of fault patterns. A report containing fault patterns and the root cause for fault patterns is sent back to a fab for making adjustment to the fabrication process to increase the overall yield of the future batch of semiconductor wafers. The report is also stored in a pattern database to serve as a library for future reference of previously recognized fault patterns, thereby to bypass the need to perform a failure analysis for matching fault patterns.
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Ho Siu-May
Peng Yeng-Kaung
Shiau Ying
Advanced Micro Devices , Inc.
Mancuso Joseph
Werner Brian P.
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