Method and apparatus for pattern inspection

Details Method and apparatus for pattern inspection Method and apparatus for pattern inspection

1988-08-15

1991-06-11

Razavi, Michael

Image analysis

Histogram processing

For setting a threshold

358106, G06K 900

Patent

active

050239171

ABSTRACT:
Accurate inspection of a pattern (14) of metallized areas (12) printed on a substrate (10) is accomplished by compensating the pattern for any deformation prior to comparing the image thereof to that of a perfect (master) pattern (14'). The amount of compensation is determined by first capturing the image of selected elements in the pattern with the aid of a television camera (32). A machine vision processor (36) processes the output of the camera (32) to determine the offset of each of the selected elements in the pattern from the corresponding elements within a master pattern (14') which represents a perfectly formed version of the actual pattern (14). From the amount of offset between the selected elements in the pattern (14) and the corresponding elements in the master pattern (14'), the amount of pattern deformation at the preselected elements, as well as at all intermediate sites, is determined and the pattern is compensated accordingly.

REFERENCES:
patent: 4668982 (1987-05-01), Tinnerino

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