Communications: electrical – Digital comparator systems
Patent
1979-03-30
1980-12-30
Boudreau, Leo H.
Communications: electrical
Digital comparator systems
3401463MA, 3401463AE, G06K 932
Patent
active
042426626
ABSTRACT:
A pattern to be examined is scanned to produce binary information of divisional regions of the pattern corresponding to the picture elements of respective scanning lines as parallel information. The parallel information regarding the shape and position of the pattern is concurrently examined under two modes. The second mode includes examination of the vertical edge and the horizontal edge, examination of the vertical and horizontal edges by compensating the deviation of mask setting in the horizontal direction, and examination of the vertical and horizontal edges by compensating the deviation of mask setting in the vertical direction.
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patent: 4021778 (1977-05-01), Ueda et al.
patent: 4107648 (1978-08-01), Frank
patent: 4156231 (1979-05-01), Edamatsu et al.
Bruning et al, "An Automated Mask Inspection System-Amis", IEEE Trans. on Electron Devices, vol. ED-22, No. 7, Jul., 1975, pp. 487-495.
Wojcik, "Automatic Detection of Semiconductor Mask Defects", Micro-Electronics and Reliability, vol. 15, pp. 585-593, Pergamon Press, 1976.
Ciarlo, "Automated Photomask Inspection", Solid State Technology, May, 1978, pp. 51-59.
Kurihara Kenji
Saito Kunio
Tsujiyama Bunjiro
Boudreau Leo H.
Helzer Charles W.
Nippon Telegraph and Telephone Public Corporation
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