Method and apparatus for pattern detection

Details Method and apparatus for pattern detection Method and apparatus for pattern detection

1989-01-25

1991-02-19

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100, G01N 2186

Patent

active

049938371

ABSTRACT:
A method and a system for pattern detection are disclosed in which a laser beam high in directivity is emitted from a laser beam source, the laser beam emitted from the laser beam source is irradiated on an uneven pattern to be detected on an object, the light component of a frequency corresponding to the cut-off frequency of an objective lens is removed from the light reflected from the object when an image of the pattern on the object is formed through an objective lens, the optical image thus formed is received by a photoelectric converting device for producing a signal waveform representing the pattern free of a signal of the frequency corresponding to the cut-off frequency, and the pattern is detected from a signal produced from the photoelectric converting device.

REFERENCES:
patent: 4668089 (1987-05-01), Oshida et al.
patent: 4865455 (1989-09-01), Kohno et al.

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