Method and apparatus for oxidizing conductive redeposition...

Details Method and apparatus for oxidizing conductive redeposition... Method and apparatus for oxidizing conductive redeposition...

2006-11-10

2011-10-25

Negron, Daniell L (Department: 2627)

Dynamic magnetic information storage or retrieval

Head

Magnetoresistive reproducing head

Reexamination Certificate

active

08045299

ABSTRACT:
A method and apparatus for oxidizing conductive redeposition in TMR sensors is disclosed. A TMR stack having a first electrode that includes at least a pinned layer and an antiferromagnetic (AFM) layer, a second electrode that includes a free layer and a tunnel barrier is formed. The TMR barrier layer is etched. Redeposition material is oxidized and the barrier is healed using an oxidizing agent selected from the group consisting of ozone and water vapor.

REFERENCES:
patent: 5729410 (1998-03-01), Fontana et al.
patent: 5898547 (1999-04-01), Fontana et al.
patent: 6278582 (2001-08-01), Okawa et al.
patent: 6656894 (2003-12-01), Peters et al.
patent: 2002/0064005 (2002-05-01), Arasawa et al.
patent: 2002/0064594 (2002-05-01), Nakajima et al.
patent: 2002/0159203 (2002-10-01), Saito et al.
patent: 2002/0186514 (2002-12-01), Childress et al.
patent: 2003/0151859 (2003-08-01), Hayashi et al.
patent: 2003/0231437 (2003-12-01), Childress et al.
patent: 61039524 (1986-02-01), None
patent: 4098747 (1992-03-01), None
patent: 5109668 (1993-04-01), None
patent: 0512211998 (1998-05-01), None
Takeshi Hattori, “Implementing a single-wafer cleaning technology suitable for minifab operations,” Micromagazine.com, 13 pages, Feb. 1, 2004.

Affiliated with

Also associated with

Rating

Method and apparatus for oxidizing conductive redeposition... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for oxidizing conductive redeposition..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for oxidizing conductive redeposition... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4277120