Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-09-11
2007-09-11
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C356S399000
Reexamination Certificate
active
10816184
ABSTRACT:
Described are systems and methods for orienting a semiconductor wafer during semiconductor fabrication with the aid of an optical alignment system, the semiconductor wafer having an alignment mark with regular structures, on the basis of which the position of the semiconductor wafer can be determined.
REFERENCES:
patent: 4408884 (1983-10-01), Kleinknecht et al.
patent: 4419013 (1983-12-01), Heimer
patent: 5726757 (1998-03-01), Kato et al.
patent: 6171736 (2001-01-01), Hirayanagi
patent: 6657736 (2003-12-01), Finarov et al.
patent: 6717670 (2004-04-01), Becker-Ross et al.
patent: 6724464 (2004-04-01), Yang et al.
patent: 6856408 (2005-02-01), Raymond
patent: 2001/0033996 (2001-10-01), Lin
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2003/0048444 (2003-03-01), Takahashi
patent: 2003/0053058 (2003-03-01), Tanaka
patent: 2004/0247172 (2004-12-01), Mitsui
patent: 2005/0088636 (2005-04-01), Kurosawa
patent: 69128667 (1991-07-01), None
Infineon - Technologies AG
Lauchman Layla G.
Patterson & Sheridan L.L.P.
Underwood J.
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