Method and apparatus for optically determining physical paramete

Optics: measuring and testing – For optical fiber or waveguide inspection

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356382, 356381, 25055928, 25055939, G01N 2100

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active

060914858

ABSTRACT:
A method and apparatus for optically determining a physical parameter of an underlayer such as the underlayer refractive index N.sub.u, extinction coefficient k.sub.u and/or thickness t.sub.u through a top layer having a first top layer thickness t.sub.1 and an assigned refractive index index n.sub.t and coefficient of extinction k.sub.t. The values of index n.sub.t and extinction coefficient k.sub.t can be estimated, optically determined or assigned based on prior knowledge. In a subsequent step a first reflectance R.sub.1 is measured over a wavelength range .DELTA..lambda. by using a test beam spanning that wavelength range. Then, a second reflectance R.sub.2 of the top layer and underlayer is measured using the test beam spanning wavelength range .DELTA..lambda. at a second top layer thickness t.sub.2. In a calculation step the physical parameter of the underlayer is determined from the first reflectance measurement R.sub.1, the second reflectance measurement R.sub.2, and the assigned or predetermined thickness values t.sub.1, t.sub.2, and the refractive index n.sub.t. and coefficient of extinction k.sub.t of the top layer. A dispersion model can be used in this calculation step. Alternatively, with transmissive samples, a first and second transmittance T.sub.1, T.sub.2 can be used.

REFERENCES:
patent: 3601492 (1971-08-01), Reichard
patent: 4355903 (1982-10-01), Sandercock
patent: 4555767 (1985-11-01), Case et al.
patent: 4676647 (1987-06-01), Kikkawa et al.
patent: 4885709 (1989-12-01), Edgar et al.
patent: 4899055 (1990-02-01), Adams
patent: 4999509 (1991-03-01), Wada et al.
patent: 5042949 (1991-08-01), Greenberg et al.
patent: 5101111 (1992-03-01), Kondo
patent: 5241366 (1993-08-01), Bevis et al.
patent: 5311284 (1994-05-01), Nishino
patent: 5337150 (1994-08-01), Mumola
patent: 5365340 (1994-11-01), Ledger
patent: 5371596 (1994-12-01), Hattori et al.
patent: 5396080 (1995-03-01), Hannotiau et al.
patent: 5457534 (1995-10-01), Lacey et al.
patent: 5471303 (1995-11-01), Ai et al.
patent: 5486701 (1996-01-01), Norton et al.
patent: 5523840 (1996-06-01), Nishizawa et al.
patent: 5541733 (1996-07-01), Gagnon
patent: 5555472 (1996-09-01), Clapis et al.
patent: 5747813 (1998-05-01), Norton et al.
patent: 5784167 (1998-07-01), Ho
patent: 5966214 (1999-10-01), Imbrock et al.
Li, G. et al., A fast, easy way to measure the thickness of DLC films, Data Storage, pp. 29-32, Jun. 1999.

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