Image analysis – Applications – Manufacturing or product inspection
Patent
1996-05-17
1999-01-26
Couso, Jose L.
Image analysis
Applications
Manufacturing or product inspection
395 13, G06K 900, G06F 1518
Patent
active
058646337
ABSTRACT:
An optical inspection device generates a plurality of measured optical data from inspection of a thin film stack. A processor evolves models of theoretical data, which are compared to the measured data, and a "best fit" solution is provided as the result. Each model of theoretical data is represented by an underlying "genotype" which is an ordered list of "genes." Each gene corresponds to a selected thin film parameter of interest. Many such individual genotypes are created thereby forming a "population" of genotypes, which are evolved through the use of a genetic algorithm. Each genotype has a fitness associated therewith based on how much the theoretical data derived therefrom differs from the measured data. Individual genotypes are selected based on fitness, then a genetic operation is performed on the selected genotypes to produce new genotypes. Multiple generations of genotypes are evolved until an acceptable solution is obtained.
REFERENCES:
patent: 4999509 (1991-03-01), Wada et al.
patent: 5148513 (1992-09-01), Koza et al.
patent: 5222192 (1993-06-01), Shaefer
patent: 5249259 (1993-09-01), Harvey
patent: 5255345 (1993-10-01), Shaefer
patent: 5343554 (1994-08-01), Koza et al.
patent: 5394509 (1995-02-01), Winston
patent: 5434796 (1995-07-01), Weininger
patent: 5493401 (1996-02-01), Horie et al.
patent: 5541848 (1996-07-01), McCormack et al.
patent: 5568590 (1996-10-01), Tolson
patent: 5581657 (1996-12-01), Lyon
patent: 5586218 (1996-12-01), Allen
patent: 5651099 (1997-07-01), Konsella
patent: 5694474 (1997-12-01), Ngo et al.
International Search Report, mailed Sep. 29, 1997, in corresponding PCT Application No. PCT/US97/08295, International filing date Apr. 30, 1997, 4 pages in length.
R.A. Sequeira, R.L. Olson, J.L. Willers & J.M. McKinion, "Automating the parameterization of mathematical models using genetic algorithms, " Computer and Electronics in Agriculture, (1994), vol. 11, pp. 265-290.
E. Michielssen, S. Ranjithan & R. Mittra, "Optimal multlayer filter design using real coded genetic algorithms," IEE Proceedings-J, Dec. 1992, vol. 139, No. 6, pp. 413-420.
T. Eisenhammer, M. Lazarov, M. Leutbecher, U. Schoffel & R. Sizmann, "Optimization of interference filters with genetic algorithms applied to silver-based heat mirrors," Applied Optics, Nov. 1, 1993, vol. 32, No. 31, pp. 6310-6315.
S. Martin, J. Rivory & M. Schoenauer, "Simulated Darwinian evolution of homogeneous multilayer systems: a new method for optical coatings design," 2319 Optics Communications, Sep. 1, 1994, vol. 110, No. 5/6, pp. 503-506.
K. Rabinovitch & G. Toker, "Genetic algorithm and thin-film design," Proceedings SPIE, Jul. 1994, vol. 2262, pp. 163-174.
S. Martin, J. Rivory & M. Schoenauer, "Synthesis of optical multilayer systems using genetic algorithms," applied Optics, May 1, 1995, vol. 34, No. 13, pp. 2247-2254.
T. Back & M. Schutz, "Evolution Strategies for Mixed-Integer Optimization of Optical Multilayer Systems," Proceedings Fourth Annual Conference on Evolutionary Programming, 1995, pp. 33-51.
D.J. Mikulin, D.A. Coley & J.R. Sambles, "Fitting reflectivity data from liquid crystal cells using genetic algorithms," Liquid Crystals, 1997, vol. 22, No. 3, pp. 301-307.
Mitchell "Genetic Algorithms: An Overview", Complexity, vol. 1, No. 1; pp. 31-39.
Koza "Introduction to Genetic Algorithms" Genetic Programming, Chapter 3.
Holland "Genetic Algorithms", Scientific American, Jul. 1992; pp. 66-72.
Riolo "Survival of the Fittest Bits" Scientific American, Jul. 1992; pp. 114-116.
J.T. Fanton, J. Opsal, D.L. Willenborg, S.M. Kelso & A. Rosencwaig, "Multiparameter measurements of thin films using beam-profile reflectometry," Journal of Applied Physics, 1 Jun. 1993, vol. 73, No. 11, pp. 7035-7040.
J.M. Leng, J.J. Sidorowich, Y.D. Yoon & J. Opsal and B.H. Lee, G. Cha, J. Moon & S.I. Lee, "Simultaneous measurement of six layers in a silicon on insulator film stack using spectrophotometry and beam profile reflectometry," Journal of Applied Physics, 15 Apr. 1997, vol. 81, No. 8, pp. 3570-3578.
E.A. Rietman & R.C. Frye, "A Genetic Algorithm for Low Variance Control in Simiconductor Device Manufacturing: Some Early Results," IEEE Transactions on Semiconductor Manufacturing, 2 May 1996, vol. 9, No. 2, pp. 223-229.
Tang et al., Automatic Design of optical thin-film systems--merit function and numerical optimization method, J.Opt. Soc. Am, vol. 72, No. 11, pp. 1522-1528, Nov. 1982.
Opsal Jon
Sidorowich John J.
Couso Jose L.
Dang Duy M.
Therma-Wave, Inc.
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