Method and apparatus for nondestructively measuring micro defect

Details Method and apparatus for nondestructively measuring micro defect Method and apparatus for nondestructively measuring micro defect

1990-10-15

1991-07-16

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

250225, G01N 2101

Patent

active

050327348

ABSTRACT:
A method and apparatus are disclosed for nondestructively measuring the density and orientation of crystalline and other micro defects on and directly below the surface of a properly prepared material such as a semiconductor wafer. The material surface is illuminated with a probe beam of electromagnetic radiation which is limited to a nondestructive power level or levels. Polarization and wavelength or wavelengths of the electromagnetic radiation are selected according to certain characteristics of the material so that penetration depth is controlled. Specific orientation of the material with respect to the probe beam and the detector is required to detect that portion of the probe beam scattered from the defects of interest, surface or subsurface, without interference from other scatter sources and to identify the orientation of the defects. Maps of scatter intensity versus position are made according to the density of the defects encountered.

REFERENCES:
patent: 3574470 (1971-04-01), Vukelich et al.
patent: 3652863 (1972-03-01), Gaskell et al.
patent: 3904293 (1975-09-01), Gee
patent: 4015127 (1977-03-01), Sharkins
patent: 4314763 (1982-02-01), Steigmeier et al.
patent: 4342515 (1982-08-01), Akiba et al.
patent: 4352016 (1982-09-01), Duffy et al.
patent: 4352017 (1982-09-01), Duffy et al.
patent: 4391524 (1983-07-01), Steigmeier et al.
patent: 4395122 (1983-07-01), Southgate et al.
patent: 4575249 (1986-03-01), Grieger
patent: 4575249 (1986-03-01), Grieger
patent: 4672196 (1987-06-01), Canino
patent: 4845356 (1989-07-01), Baker
patent: 4873430 (1989-10-01), Juliana et al.
patent: 4904877 (1990-02-01), Pietzsch
patent: 4933567 (1990-06-01), Silva et al.
patent: 4978862 (1990-12-01), Silva et al.
F. D. Orazio, Jr., W. K. Stowell and R. M. Silva, Instrumentation of a Variable Angle Scatterometer (VAS), Aug., 1982.
W. K. Stowell, R. M. Silva and F. D. Orazio, Jr., Damage Susceptibility of Ring Laser Gyro Class Optics, Aug. 1982.
R. M. Silva, F. D. Orazio, Jr. and W. K. Stowell, Scatter Evaluation of Supersmooth Surfaces, Aug. 1982.
IBM Technical Disclosure Bulletin, vol. 20, No. 8, Jan. 1978, Automatic Brewster's Angle Thin Film Thickness Measurement Spectrophotometer, Chwalow, et al.

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