Printing – Antismut device – Anti-offset material application
Patent
1981-01-02
1983-01-18
Eickholt, E. H.
Printing
Antismut device
Anti-offset material application
101 1, 101DIG13, 118623, 118625, 118642, 118671, 346140R, 346155, 427 13, 427 141, 430118, 355 10, G01D 544, B05B 502
Patent
active
043686699
ABSTRACT:
An improved method and apparatus for non-impact printing on a substrate is disclosed. The substrate is dried and one surface thereof is coated with a barrier material, after which a marking material immiscible with the barrier material is applied to that surface. An electric field generator which may be in the form of an array of electrical styli is positioned adjacent a second surface of the substrate, opposite the point of application of the marking material. Vacuum means may be used to promote contact between the substrate and the styli. Voltage selectively applied to the styli allows the marking material to displace the barrier material and wet the previously coated substrate surface, thereby forming a printed image.
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"Contrography, A New Electronic Imaging Technology", Photographic Science & Engineering, vol. 15, No. 5, Sep.-Oct. 1971, pp. 431-436.
Eickholt E. H.
Fisher George M.
Milliken Research Corporation
Petry H. William
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