Method and apparatus for non-contact metal plating of semiconduc

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area

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205137, 205147, 205148, 205 87, C25D 502

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active

061325864

ABSTRACT:
Plating of metal interconnections in semiconductor wafer manufacturing is performed by providing relative motion between a bipolar electrode assembly a single metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto.

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