Method and apparatus for multivariate fault detection and...

Details Method and apparatus for multivariate fault detection and... Method and apparatus for multivariate fault detection and...

2007-07-24

2007-07-24

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S109000, C438S014000

Reexamination Certificate

active

11035276

ABSTRACT:
The present invention provides a method and apparatus for multivariate fault identification and classification. The method includes accessing data indicative of a plurality of physical parameters associated with a plurality of processed semiconductor wafers and providing at least one summary report including information indicative of at least one univariate representation of the accessed data and at least one multivariate representation of the accessed data.

REFERENCES:
patent: 7123980 (2006-10-01), Funk et al.
patent: 2005/0015176 (2005-01-01), Harada et al.
patent: 2005/0047645 (2005-03-01), Funk et al.
patent: 2005/0165731 (2005-07-01), Funk
Cherry et al., “A Generic Object-Oriented System for Wafer-Level Fault Detection and Classification (FDC),” AEC/APC Symposium XV., Sep. 13-18, 2003.
Good et al., “Semiconductor Process Monitoring and Fault Detection Using Recursive Multi-Way PCA Based on a Combined Index” AEC/APC Symposium XIV., Sep. 7-12, 2002.

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